Excess low-frequency noise in AlGaNÕGaN-based high-electron-mobility transistors
نویسندگان
چکیده
The low-frequency 1/f noise characteristics of AlGaN/GaN high-electron-mobility transistors with gate length scaled down to 150 nm grown on sapphire by metalorganic chemical vapor deposition have been studied. Certain features of the 1/f noise have been revealed in these short-gate transistors. The low-frequency noise spectra show drastically different behavior depending on the gate voltage VG in the range of low (VGt<VG<0) and high (VG,VGt) biases. The noise spectra-gate bias dependences allow one to distinguish a spatial redistribution of effective noise sources in the transistor channel. The Hooge parameter has been deduced separately for the ungated region, aH p .10, and for the gated region, aH a .2310, of the transistor channel. These values are as low as those previously observed in nitride heterostructures grown on silicon carbide substrates. © 2002 American Institute of Physics. @DOI: 10.1063/1.1463202#
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تاریخ انتشار 2002